Chemical Mechanical Polishing 化学机械抛光 ; 化学机械研磨 ; 技术 ; 研磨
chemical mechanical polishing CMP 化学机械抛光
chemical-mechanical polishing machine 化学机械抛光机
chemical mechanical polishing cmp technology 化学机械抛光技术
CMP chemical mechanical polishing 机械化学抛光
chemical-mechanical polishing cmp 化学机械抛光
copper chemical-mechanical polishing 铜化学机械抛光
chemical mechanical polishing process 化学机械抛光
the chemical mechanical polishing cmp 化学机械抛光
chemical mechanical polishing for ulsi ulsi化学机械抛光
Polishing pad is a very important component of the chemical-mechanical polishing (CMP) system.
抛光垫是化学机械抛光(CMP)系统的重要组成部分。
The copper chemical-mechanical polishing (CMP) which is the key planarization technology for ULSI manufacturing was discussed.
对用于甚大规模集成电路(ULSI)制造的关键平坦化工艺———铜化学机械抛光(CMP)技术进行了讨论。
The invention further provides methods of polishing a substrate using each of the above-described chemical-mechanical polishing compositions.
本发明进一步提供一种使用上述各化学机械抛光组合物抛光基材的方法。
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